Scanning Probe Microscopy Technologies

Date: 29 Sep 2004 - 29 Sep 2004

Venue: SIMTech, Auditorium, Tower Block, Level 3

Introduction :

Scanning probe microscopy (SPM) is a powerful technology which enables imaging with lateral resolution ranging from 100 µm (micron) to 10 pm (pico-meter). Today, SPM is routinely used in a wide range of surface properties on nano-meter scale including topography, friction, magnetic field, and electric field. Since its invention in 1982, SPM has found applications as diverse as DNA imaging, including defects of semiconductors, measuring fundamental physical and chemical properties of surfaces. This seminar aims to provide participants with a better understanding of the SPM principles, the various established SPM techniques, the recent instrumentation development, and the advanced applications of SPM in measurements.

Seminar Outline :

Part I: Introductory Scanning Probe Microscopies - Principles of Scanning Probe Microscopes (SPMs) - Operation modes in SPMs - Problems to be aware of - Special Tips - Basic introduction into technology oriented techniques

Part II: Advanced SPM Techniques - Techniques for characterisation of materials - Techniques for device diagnostics - Hybrid techniques via combination of scanning electron and scanning probe microscopy - Towards a routine system for industrial applications

Who should attend :

Plant Managers, Process Engineers, IC Design Managers, Engineers from the Semiconductor Manufacturing Industries, Semiconductor Equipment Suppliers, R&D Engineers, Precision Engineering Managers and Academic staff working on microelectronics, nano-electronics, precision engineering, semiconductor manufacturing, IC chip design and precision measurements.