Electrochemical Deposition of Nanostructures, Micropatterns and Functional Thin Films

Event Date: 20 Jul 2017 (Thursday) - 20 Jul 2017 (Thursday)

Innovis Building, Multipurpose Hall 1, Level 1

Time :10:00 - 11:00

Dr. Liu Liang
Laboratoire de Chimie Physique et Microbiologie pour l’Environnement (LCPME), CNRS-Université de Lorraine

Host: Dr. Derrick Fam (Molecular Materials Department, IMRE)


Electrochemical deposition is known as an important approach for preparing thin films and coatings. It is easy to control the process by electric parameters, which enables coating complex-shaped substrates and selectively depositing onto the conductive parts of the surface. In this seminar, several electrochemical deposition approaches through different mechanisms, yielding nanostructures, micropatterns and functional thin films, will be presented.

Specifically, nanostructures have been electrochemically deposited from the dispersions of nano-structured materials, such as WO3 nanoparticles, carbon nanotubes and graphene oxide nanosheets. This “nano to nano” concept has the advantage of maintaining the size and shape of the nanostructures during the deposition process. Electrochemical deposition can also be spatially confined to micrometer resolution by scanning electrochemical microscopy (SECM), through the feedback or direct mode. The former was used for patterning silane on both conductive and insulating surfaces, while the latter was applied for patterning carbon nanotubes (with silane) and graphene. The electrochemically deposited films have numerous applications. For example, silane sol-gel films prepared by electrochemically-assisted deposition showed enhanced corrosion resistance as compared with dip-coated films. This unique process is indirect electrodeposition, which is based on an electrochemically generated catalyst (OH- ions) that catalyzes a non-electrochemical deposition process. It was also used for depositing silane/CNT composite films for anti-reflection black coatings and non-linear optics. Analytical equations as well as numerical simulation were derived for modeling the kinetics of electrochemically-assisted deposition. Besides, electrodeposited WO3 nanocrystalline films had excellent electrochromic performance. In essence, the power of electrochemical deposition approaches, which lead to functional films with controllable structure and patterns, will be demonstrated.




Dr. Liu Liang received his PhD degree in 2010 from Zhejiang University, China (with 5 months research experience in University of Cincinnati, USA). From 2010-2012, he worked as postdoctoral researcher with Prof. Daniel Mandler in The Hebrew University of Jerusalem, Israel. Following that, he joined the CREATE Program “Nanomaterials for energy and water management” working as research fellow with Prof. Lee Pooi See, Nanyang Technological University, Singapore. He joined CNRS in February 2016 as a permanent researcher (Chargé de Recherche), and is now working in Laboratoire de Chimie Physique et Microbiologie pour l’Environnement (LCPME) in Nancy, France. Dr. Liu’s main research interests include the development of electrochemical deposition methodology and novel instrumentation for scanning electrochemical probe techniques.


Admission is free

Dress Code: Office Attire

For registration, please click here


Last update : 8/21/2018 2:59:21 PM