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A Brief Introduction to Nanoimprint Lithography

Nanoimprint Lithography (NIL) is a surface patterning technique that, in the recent literature, has been shown to provide resist linewidth resolutions anywhere from several hundred microns down to about 5 nm. NIL can be broken down into three main mechanisms: Hot embossing, thermal curing NIL and UV-NIL.

A very basic NIL hot embossing process is shown in Figure 1. Essentially the surface pattern of a hard mold is replicated into a thermoplastic resist material at elevated pressure when the temperature is raised above the glass transition temperature of the resist.

Last update : 8/3/2015 2:23:56 PM