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Dr. BOSMAN Michel

Scientist III

Staff

Joint Appointments, Advanced Characterisation and Instrumentation (ACI) Department

6319 4848

bosmanm@imre.a-star.edu.sg,

2 Fusionopolis Way. Innovis, #08-03, Singapore 138634


Research Details



  Nano-optics and plasmonics (monochromated EELS and cathodoluminescence)

  In-situ TEM (imaging and spectroscopy of dynamical processes)

  Nanoscale characterization of gate oxides

  TEM/STEM-based chemical characterization

 Hybrid Nanoplasmonics (NRF2016-NRF-ANR002)

 In-situ STEM for 3D Microelectronics Nanofabrication (NRF-CRP16-2015-05)

 

06/2010 - Present: IMRE (A*STAR, Singapore), Scientist
11/2007 - 06/2010: IME (A*STAR, Singapore), Senior Research Engineer
06/2006 - 08/2007: University of Sydney (Australia), Post-Doctoral Associate
11/2002 - 03/2003: NIMR (the Netherlands), Research Engineer
03/2002 - 06/2002: Sonion (the Netherlands), Process Development Engineer

 

2007: PhD (Electron Microscopy), The University of Sydney, Australia
2002: MSc (Materials Science), Delft University of Technology, the Netherlands

Adjunct A/Prof. at MSE-NUS (the Department of Materials Science and Engineering at the National University of Singapore)
  1. N.D. Loh et al: Multi-step nucleation of nanocrystals in aqueous solution
    Nature Chemistry 9, 77-82 (2017)

  2. S. Mei et al: Compliance current dominates evolution of NiSi2 defect size in Ni/dielectric/Si RRAM devices
    Miroelectronics Reliability 61, 71-77 (2016)

  3. Z. Fan et al: Stabilization of 4H hexagonal phase in gold nanoribbons
    Nature Communications 6:7684, 1-8 (2015)

  4. A. Teulle et al: Multimodal plasmonics in fused colloidal networks
    Nature Materials 14, 87-94 (2015)

  5. M. Bosman et al: Encapsulated Annealing: Enhancing the Plasmon Quality Factor in Lithographically–Defined Nanostructures
    Scientific Reports 4 5537 (2014)

  6. Z. Li et al: An Epitaxial Ferroelectric Tunnel Junction on Silicon
    Advanced Materials 26, 7185-7189 (2014)

  7. S.F. Tan et al: Quantum Plasmon Resonances Controlled by Molecular Tunnel Junctions
    Science 343, 1496-1499 (2014)

  8. M. Bosman et al: Surface Plasmon Damping Quantified with an Electron Nanoprobe
    Scientific Reports 3 1312 (2013)

  9. H. Duan et al: Nanoplasmonics: Classical down to the Nanometer Scale
    Nano Letters 12, 1683-1689 (2012)

  10. M. Bosman et al: Light Splitting in Nanoporous Gold and Silver
    ACS Nano 6(1) 319-326 (2012)


    1. Yang, J.K.W.; Bosman, M.; Duan, H. Kumar, K.; Phang, I.Y. Process for creating lithographically-defined plasmonic structures with enhanced Q-factors.US patent, application pub. no. US 2013/0243947 A1 (2013).

    2. Yang, J.K.W.; Bosman, M.; Duan, H. Kumar, K.; Phang, I.Y.A process for creating lithographically-defined plasmonic structures with enhanced Q-factors.Singapore patent, application no. 201201971-7 (2012).

    3. de Roo, D.I.; van Halteren, A.Z.; Lafort, A.M.; Marissen, R.A.; de Nooij, M.; Bosman, M.; Mogelin, R.Electret Assembly for a microphone having a backplate with improved charge stability and improved humidity stability.European Patent no. 11156577.6-2225 (2011).

    4. van Halteren, A.Z.; Marissen, R.A.; Bosman, M.; de Roo, D.I.; Mogelin, R.; de Nooij, M.Electret Assembly for a microphone having a backplate with improved charge stability.US Patent no. 7,136,496 B2 (2006).


Last updated on : 05 Apr 2019 05:09 PM