Seminar: Particle Beam Techniques in Nanotechnology R&D

Date: 16 Mar 2011 - 16 Mar 2011

Venue: SIMTech Auditorium, Tower Block

This seminar is designed to present the recent developments in particle beam techniques that are specially catered for Nanotechnology R&D. The event is co-sponsored by Carl Zeiss, Shimadzu (Asia Pacific), and JEOL Asia.

Nano-scale material analysis techniques using SEMs
Professor Khursheed Anjam, NUS 
This talk will present various energy spectrometer attachment designs for SEMs, which enable them to superimpose quantitative material analysis information on to their nano-scale images. Various spectrometer attachments will be presented, electric sequential ones, as well as a magnetic parallel energy one. The design of these spectrometers have been pioneered by the group led by Prof Anjam Khursheed in the Electrical and Computer Engineering Dept at the NUS. The spectrometer attachments have various applications for the semi-conductor industry. One application is  PN junction dopant mapping/profiling using secondary electron energy spectra. Another application is elemental analysis through the use of Auger electrons, an alternative/companion  technique to EDX. Another complementary elemental mapping method to EDX is to use backscattered electron spectra (BSE). This is useful where there are single distinct elements. Both the Auger and BSE material analysis techniques promise much higher image resolution (nano-meters) than current EDX, and can be obtained for much lower landing energies (down to say 1 keV). Current EDX methods typically require high landing energies (10-15 keV), and have relatively low image resolutions (microns).

The Auriga® CrossBeam® SEM-FIB system – Your universal nano workstation
Mr Henry Cai, Carl Zeiss SMT Pte Ltd, Application Specialist

The unique CrossBeam® Workstation is combining the unequalled imaging power of the proprietary GEMINI® field emission SEM column with the sophisticated high performance focused ion beam column into one extraordinary powerful system. The superior eucentric stage, together with a sophisticated compact multi-channel gas injection system makes the CrossBeam® Workstation to an ultimate analysis and inspection tool. The Carl Zeiss CrossBeam® Workstation AURIGA® allows to individually tailor systems assures that every CrossBeam® Workstation can be configured for demanding applications. The unique live imaging capabilities over the entire magnification range during FIB operation give full control when working on critical samples.

XPS Technique and Its Applications in Nanotechnology
Mr Tan Teck Beng, Shimadzu (Asia Pacific) Pte Ltd
XPS (X-ray Photoelectron Spectroscopy), or better known as ESCA (Electron Spectroscopy for Chemical Analysis) to some researchers, has been commercially available for analysis since the 1960s. As the measured signal is the photoelectron, only information from the first 10nm from the surface is gathered.  We can obtain not only the chemical composition but also the chemical states from the analysis.  This makes it a very valuable tool for material characterisation, especially so for nanotechnology.  The add-on options available also improve its multi-technique capability.  They include Auger Spectroscopy, Ultra Violet Spectroscopy, Ion Scattering Spectroscopy, Secondary Ion Mass Spectroscopy, polyatomic ion source. Though the basic building blocks of the system have not changed, the Ultra High Vacuum (UHV) technology, electronics, sample handling, data processing have improved tremendously. From the early days of large area spectroscopy analysis, we have advanced to do small spot local analysis, high resolution scan of chemical states, 2D imaging, angle resolved, depth profiling etc. Samples are no longer restricted to conductor and solid which are only stable in UHV. In this talk, I will introduce the basic principles of XPS, the information that can be extracted from the analysis.  I will also introduce some of the applications such as bulk characterisation, thin films analysis etc.

Latest Developments in Field Emission SEM for NanoTechnology
Mr Tan Teck Siong, JEOL Asia Pte Ltd
n the current world of Nanotechnology, it is important to have an ultra-high resolution microscope that can reveal fine details on nano particles. In the presentation, we will introduce a Schottky Field Emission SEM that has very good resolution even at low accelerating voltage, and it also comes with features such as Gentle Beam mode that can improve resolution as well as removing charging on non-conductive samples, and r-filter mode that can provide secondary electrons and backscattered electrons signals by using the same detector. STEM detector and its application will discussed next and finally, some application data will be shown and discussed.

Detecting and Differentiating Electron Signals in SEM
Ms Chow Shue Yin, Application Specialist, Carl Zeiss NTS Pte Ltd 
Secondary electrons (SE) and backscattered electrons (BSE) are principal signals used to form images in scanning electron microscope (SEM). These signals carry information about specimen composition, shape (topography) and surface texture. When multiple detectors are available in a same SEM, the microscopist can examine image made with each detector separately or in combination. Such studies are useful in characterizing nature of specimen, when a single detector image might not give adequate information. The complete detection system available in Carl Zeiss SEMs, ULTRA and MERLIN, combines in-lens SE detector for high resolution, topographic imaging and Energy selective Backscattered electron (EsB) detector for low voltage, high resolution compositional contrast imaging. This unique combination of in-lens SE detector and EsB detector enables real time imaging of SE and BSE signals independently as well as real time mixing of the two kinds of signals. Together with Angle selective Backscattered electron (AsB) detector and Scanning Transmission Electron Microscope (STEM) detector, all different electron signals coming from sample can be detected. In this presentation, imaging of nano-materials and composites using in-lens SE, EsB and AsB detectors will be discussed.

About the Speaker
Professor Khursheed Anjam, Centre for Integrated Circuit Failure Analysis & Reliability (CICFAR), National University of Singapore
Associate Professor Anjam Khursheed joined the NUS in 1995. He obtained his PHD in the subject of SEMs and electron spectrometers in 1983 at the University of Edinburgh in Scotland. He has over 30 years experience in charged particle optics instrumentation design and is the author of a recent book entitled, “Scanning Electron Microscope Optics and Spectrometers”. He was designated Conference Chair of the 8th International Conference on Charged Particle Optics, which was recently successively held in Singapore in July 2010.

Mr Henry Cai, Carl Zeiss SMT Pte Ltd, Application Specialist
Mr Henry Cai completed his Bachelor of Engineering (Hons) Degree in Nanyang Technological University in 2004. After his graduation, he started his first career with STATS ChipPAC as a Test Product Engineer. From 2008 - 2010, he joined Nanyang Technological University as a Project Officer. During this period, his main research project was microelectronics failure analysis. He specialised in material characteriaation using SEM, FIB and TEM. He is also pursuing his part-time PHd study on the metallic nanowires as interconnect in Nanyang Technological University. In 2010, he joined Carl Zeiss, with the Nano Technology Systems Division (NTS). Currently, he is an Application Specialist responsible for all SEM and FIB application support in South East Asia.

Mr Tan Teck Beng, Shimadzu (Asia Pacific) Pte Ltd
Mr Tan Teck Beng is the Product Specialist for Scientific Instrumentation (XRF, XRD, EPMA, SPM and ESCA/XPS) in Shimadzu (Asia Pacific), Singapore. He has conducted numerous application seminars, workshops and talks for failure analysis, RoHS/ELV applications and food packaging both in government institutions and private industries. The countries where he has conducted Shimadzu Seminars include Malaysia, Indonesia, Thailand, India, Philippines and Singapore.  He is actively providing training and developing applications to utilise Shimadzu scientific instruments for elemental analysis for safety regulations, material characterisation, R&D, quality assurance and nanotechnology. He graduated from the National University of Singapore with MSc in Materials Science.

Mr Tan Teck Siong, JEOL Asia Pte Ltd
Mr Tan is the Assistant Sales Director and SEM Product Manager for JEOL ASIA - Singapore. He holds a Bachelor degree in Electrical and Electronics Engineering in 1992 from NUS - Singapore. He was a Research Engineer in Institute of Microelectronics for one year in Singapore and subsequently Joined JEOL Asia Pte Ltd in1995. 


Ms Chow Shue Yin, Application Specialist, Carl Zeiss NTS Pte Ltd
Ms Chow graduated from the National University of Singapore with Bachelor of Science (Honours) in 1999. She joined the Institute of Materials Research & Engineering from 2000 until 2008 as Research Officer, with material characterization using transmission electron microscope as principal portfolio. She joined Carl Zeiss NTS Pte Ltd since June 2008 as application specialist. 

9.00am    Registration

9.15am    Welcome & Introduction

9.25am    Nano-scale Material Analysis Techniques using SEMs by Prof. Khursheed Anjam, NUS
9.50am    The Auriga® CrossBeam® SEM-FIB system – Your universal nano workstation

               by Mr Henry Cai, Carl Zeiss SMT Pte Ltd, Application Specialist 

10.15am   XPS Technique and Its Applications in Nanotechnology by Mr Tan Teck Beng, Shimadzu (Asia Pacific) 
10.40am   Refreshment & Networking
11.10am   Latest developments in Field Emission SEM for NanoTechnology by Mr Tan Teck Siong, JEOL Asia Pte Ltd
11.35am   Detecting and differentiating electron signals in SEM

                 by Ms Chow Shue Yin, Application Specialist, Carl Zeiss NTS   
12.30pm   End of Seminar

Who Should Attend
Industry professionals, R&D managers, Government agencies staff, researchers, academic staff and students. 

Pre-registration for the seminar is required. Seats are available on a first-come, first-served basis. To reserve a seat for this non-chargeable event, please register online.

Contact Us
For technical enquiries: Dr Dmitry Isakov, Tel: 6793 2375, Email:
For general enquiries: Alice Koh, Tel: 6793 8249, Email: