Workshop on Advanced Nanoscale Surface Metrology Technology

Date: 20 Nov 2008 - 20 Nov 2008

Venue: SIMTech Seminar Room, Level 1, Valley Block

Jointly organised by SIMTech and NMC, this workshop is designed for participants to gain a proper understanding of the latest trends and development in nanoscale metrology technologies encompassing the fundamental principles and the state-of-the-art technologies for precision measurement, process monitoring and quality control in nano manufacturing processes. 

Key topics include: 
- Introduction to Surface Finish Metrology 
- Comparison of Techniques for Measuring Surface Finish 
- Scanning Near-field Optical Microscopy and Its Application for Failure 
  Analysis of Semiconductor Devices
- Large Scanning Range Metrological Atomic Force Microscope for Traceable
  Nano-scale Calibration of Standard Artifacts 
- Nano- and Atomic Scale Length Metrology

About the Speakers

Dr Theodore Vorburger heads the Surface and Microform Metrology Group in the Precision Engineering Division at the National Institute of Standards and Technology.  His group is responsible for surface roughness and step height calibrations, which underpin the national measurement system for surface finish. Ted is co-leader of a project to develop standard bullets and standard casings for forensics laboratories.  He has also led the development of a calibrated atomic force microscope for calibrations of surface nano-scale length specimens, the development of a light scattering system for measuring surface roughness, and has collaborated in the development of the world’s first sinusoidal-roughness Standard Reference Materials.  He is a member and former Chair of the American Society of Mechanical Engineers Standards Committee B46 on the Classification and Designation of Surface Qualities and a Subject Matter Expert for the equivalent Working Group under the International Organisation for Standardisation (ISO).  Ted has been working in Surface Metrology since 1976 and is the author or co-author of approximately 160 publications in the fields of surface metrology, nanometrology, surface physics, atomic physics, chemical physics, and automated measurements. Between March 2007 and April 2008, Ted worked on detail as Acting Deputy Director of the Center for Nanoscale Science and Technology, a new organisational unit of NIST. He holds a B.S. degree from Manhattan College and an M.S. and Ph.D. from Yale University all in Physics.

Dr Zhang Ying received his B.E., M.E., and Ph.D. degrees from Southeast University in 1989, 1992 and 1995 respectively. From 1996 to 1997, he was a postdoctoral fellow with Nanyang Technological University, Singapore. He has been working for Singapore Institute of Manufacturing Technology since 1998 and is the Group Manager and Senior Scientist of Precision Measurements Group with concurrent appointment as adjunct Associate Professor at Nanyang Technological University, Singapore. A member of OSA. his current research interests include nano-scale optical measurements, photonics, adaptive signal processing and control, and image processing. He has published over hundreds of referable journal and conference papers. He is the recipient of the National Outstanding Doctorial Dissertation Award from the State Council of China in 1999; the Best Project Award of Photonics Europe’2004 from SPIE in 2004, and the IES Prestigious Engineering Achievement Award 2005 in Singapore. 

Dr Wang Shihua is a Senior Metrologist of the Optical Metrology Department of the National Metrology Centre of A*STAR (Agency for Science, Technology and Research). He is currently involved in the area of Nanometrology, especially in the development of metrological atomic force microscope (AFM). Dr Wang received his BEng, MEng and PhD degrees from the Sichuan University in Chengdu, Sichuan of China, in 1987, 1990 and 1996 respectively. Prior to joining NMC in 2005, Dr Wang worked as a research fellow in the Department of Mechanical and Production Engineering, National University of Singapore and a lecturer and associate professor in Sichuan University, China. With over 10 years R&D experience actively in laser interferometric surface profile, length and dimensional measurements, light scattering surface roughness measurement, microelectromechanical systems (MEMS) testing and optics-mechanical design, Dr Wang has published over 60 journals and conference papers. 

8.45am     Registration

9.15am     Welcome Address by Dr Zhang Ying, Group Manager, Precision
                Measurements Group

9.30am     Introduction to Surface Finish Metrology (Dr Theodore Vorburger)
                Please click here for the presentation slides.

10.30am   Tea Break & Networking

11.00am   Comparisons of Optical and Stylus Methods for Measurement
                of Surface Finish (Dr Theodore Vorburger)
                Please click here for the presentation slides

12.00pm   Lunch
  1.30pm   Nano- and Atomic-scale Length Metrology (Dr Theodore Vorburger)
                Please click here for the presentation slides 

  2.450pm   Large Scanning Range Metrological Atomic Force Microscope for
                Traceable Nano-scale Calibration of Standard Artifacts
                (Dr Wang Shihua)
                Please click here for the presentation slides
  3.45pm   Tea Break & Networking
  4.00pm   Tour of Nanometric Meaurement Lab, SIMTech

  5.00pm   End of the Workshop

Who Should Attend
Managers, engineers, academic staff and researchers from semiconductor, electronics, optics, equipment and precision engineering related companies, research institutes, university and polytechnics.

Pre-registration for the workshop is free of charge. Seats are reserved on a first-come, first-served basis.

For technical enquiries:
Dr Fang Zhongping, Senior Scientist, Precision Measurements Group, Email:

For registration & general enquiries:
Alice, Email: