Seminar on Dimensional Metrology of Nanoscale Structures with X-rays and Neutrons

Date: 27 Mar 2008 - 27 Mar 2008

Venue: SIMTech Training Room, Tower Block, Level 3

This event is jointly organised by the National Metrology Centre.

The semiconductor industry has exploited productivity improvements through aggressive feature size reduction for over four decades.  While enormous effort has been expended in developing the optical lithography tools to print ever finer features, significant advances have also been required to measure the printed features.  We have developed a new measurement platforms based on small angle scattering and reflectivity of x-rays and neutron beams that is capable of measuring the pitch, line-width, sidewall angle, average cross section, and line edge roughness in patterns ranging from 10 nm to 500 nm in width with sub-nm precision.  In this seminar, we review current and potential capabilities for these measurements for critical dimension metrology. 

Seminar Outline:

Part I : X-ray and Neutron Reflectivity
• Basic principles of reflectivity at grazing angles
• Analysis of uniform thin films and thin film material stacks
• X-ray and neutron porosimetry:  Characterization of nanoporous thin films
• Analysis of patterned thin films using the effective medium approximation
• Examples:  low-k dielectric thin films, photoresists patterns, nanoimprint lithography

Part II: Small Angle X-ray and Neutron Scattering

Critical Dimension Small Angle X-ray Scattering (CD-SAXS) measures the diffraction of a collimated X-ray beam from a repeating pattern to determine the average pattern cross section and line-edge roughness.  The measurement is performed non-destructively in transmission through standard silicon wafers and can be applied to patterns in photoresists, dielectrics, and metals.
• Basic principles of small angle scattering
• Instrumentation requirements
• Analysis of the structure of nanoscale periodic patterns
- Pitch
- Line-width
- Side-wall angle
- Cross-section
- Line-edge roughness
• Comparison with SEM, OCD and AFM measurements
• Examples: Etched low-k dielectric, EUV photoresist patterns, nanoimprint lithogrphy

About the Speaker

Dr Eric Lin is Chief of the Polymers Division in the Materials Science and Engineering Laboratory at the National Institute of Standards and Technology (NIST).  He received a B.S.E. from Princeton University in 1991 (summa cum laude) and Masters and Ph.D. degrees from Stanford in 1992 and 1996, respectively, all in chemical engineering.  Eric joined the NIST Polymers Division as an NRC-NIST postdoctoral associate in 1996, and joined the permanent staff in 1998.  In 2002, he became the Leader of the Electronics Materials Group, where he established world class research programs in semiconductor electronics processing, nanoscale materials, and organic electronics.  Eric has established himself as a leader in the polymer science community.  He has published more than 100 papers in peer-reviewed journals.  He has received the NIST Bronze and Silver Medals, the NIST Slichter Awards twice, the Presidential Early Career Award for Scientists and Engineers (PECASE), and a participant in the National Academy of Science Kavli Frontiers of Science program.  He is active in several professional organizations including the American Institute of Chemical Engineers as a Councilor in the Materials Division, the American Physical Society through the Committee on Minorities, and the Materials Research Society as a symposium organiser.

Who Should Attend 
This event is targeted at engineer, scientists, managers, engineering academic staff and students who are interested in X-ray and neutron reflectivity and small angle X-ray and neutron scattering.


1.30 pm - 2.00 pm : Registration
2.00 pm - 3.45 pm : Session 1
3.45 pm - 4.15 pm : Networking and Refreshments
4.15 pm - 6.00 pm : Session 2

Registration Fee (inclusive of 7% GST)
SIMTech Members: $40.00 per pax (after 20% discount)
Non-SMS Member : $50.00 per pax
Fees inclusive of seminar slides and refreshments.

All cheques/bank drafts should be made payable to 'Singapore Institute of Manufacturing Technology', crossed and marked "A/C payee only". 

Pre-registration for the seminar is necessary. 

For technical enquiries, please contact:
Ms Tan Siew Leng, Head of Optical Metrology Department, National Metrology Centre (NMC), Tel: 6279 1938, Email:
Dr Andrew Malcolm, SIMTech Research Scientist, Tel: 6793 8295, 

For registration and billing enquiries, please contact 
Alice Koh, Tel: 6793 8249, Email: