Advanced Metrology Technology for Semiconductor Manufacturing & Nano Technology

Date: 20 Mar 2007 - 22 Mar 2007

Venue: Training Room 1 (Level 3, Tower Block)

As the linewidth of semiconductor technology has been reducing over the years to nanometer range from 130nm to 32nm, there is a growing need for advanced measurement techniques such as overlay metrology, CD metrology, atom-based metrology, scatterfield metrology, scanning probe microscopy, and SEM metrology in semiconductor and nano technology industry. In this workshop, a well-known expert from NIST and SEMI Microlithography Committee together with the senior researchers from SPRING Singapore and SIMTech will present the trends and research development in metrology technologies.

This 3-day intensive course is designed to teach emerging topics, including the fundamental principles and the state-of-the-art micro and nano metrology technologies for precision measurement, process monitoring and quality control in semiconductor and nano manufacturing processes.

Who Should Attend
Managers, engineers, academic staff and researchers from semiconductor, electronics, optics, equipment and precision engineering related companies, research institutes, university and polytechnics.

Pre-registration for the workshop is necessary.
Registration fee (inclusive of 5% GST, course materials, buffet lunch & refreshment.):
SMS Member: S$552.00, non-SMS Member: S$690.00