This research aims to develop capabilities in patterning micro-, nano- structures and devices using thermoplastics. Fundamental investigations are conducted using NEB-22 resist as the substrate material in the imprinting of micro- and nano- structures. Imprinting on 200 mm diameter wafers has been achieved with well acceptable uniformity. Features with linewidths down to 50 nm and uniformity with less than±1% over an 8-inch wafer has been obtained. Micro-gratings for optical sensing, nano-scaled channels and pillars for bio-related filtering have been manufactured. The coating of self-assembled monolayers (SAMs) on silicon moulds to assist demoulding had been studied.
Contact PersonNg Sum Huan Gary(shng@SIMTech.a-star.edu.sg)
SolutionNanoimprinting technology, as one of the most promising fabrication technologies, has been demonstrated to be a powerful tool for large area replication up to wafer-level, with features down to nanometre scale.
ApplicationsThis fast and low cost method becomes an increasingly important solution for the fabrication of biochemical, microfluidic, micro-optical and telecommunication devices. Due to its advantages over conventional fabrication methods in terms of process flexibility, process simplicity, low cost and bio-compatibility, nanoimprinting will find wide applications in fluidic systems, biomedical systems as well as optical and sensing systems.
This project aims at developing in-house capabilities in the large area patterning of micro- and nano- features on polymer substrates.