Researcher Portfolio

DONG Xuecheng (Dr)
Scientist III
6419 7406
Surface Technology

Dr Dong Xuecheng is a research scientist with more than 7 years of professional experience in initiating and managing research projects.

Graduated from University of Cincinnati with a PhD in materials science and engineering in 2012, he joined Singapore Institute of Manufacturing Technology (SIMTech). He has knowledge and experience in both technology development and project management, a truly versatile yet specialised R&D professional. His background includes electrochemistry, corrosion protection, micro- and nano- membrane filtration, as well as neutron and X-ray diffraction, reflection, and scattering.

In SIMTech, he leads the development of plasma electrolytic oxidation (PEO) process for light weight metal surface treatment. He also leads aerospace projects sponsored by A*STAR Aerospace Programme Consortium and aerospace giants such as Boeing and Airbus and Principal Investigator of solvent recovery project for GSK with a total close to 2 million research fund, as well as other industrial projects for local and overseas companies. As the Research Liaison Office representative, he coordinates collaboration with many educational institutions in the form of joint projects, joint seminars and forums; also built partnership with local and overseas universities for joint research efforts.

Research Interest:
  1. Development of coating processes for light weight metals, including aluminium alloys, and magnesium alloys

  2. Development of membrane technologies for water and solvent treatment

  3. Development of coating reparation technologies for aerospace Maintenance, Repair and Overhaul (MRO)


PhD (Material Science and Engineering), MBA, BEng (Material Science and Engineering)

  1. Hu N, X Dong, et al. (2015). Effect of sealing on the morphology of anodised aluminum oxide. Corrosion Science 97: 17-24
  2. Dong, X (2015). Surface Treatments for Magnesium Alloys. Handbook of Manufacturing Engineering and Technology. A. Y. C. Nee. London, Springer London: 3031-3054
  3. Hu N, X  Dong, et al. (2013). Interfacial morphology of low-voltage anodic aluminium oxide. Journal of Applied Crystallography 46(5): 1386-1396
  4. Dong X, S Argekar, et al. (2011). In situ Evolution of Trivalent Chromium Process Passive Film on Al in a Corrosive Aqueous Environment. ACS Applied Materials & Interfaces 3(11): 4206-4214
  5. Wang P, X Dong, et al. (2010). Structure and water-barrier properties of vanadate-based corrosion inhibitor films. Corrosion Science 52(3): 943-949
  6. Dong X, P Wang, et al. (2010). Structure and Composition of Trivalent Chromium Process (TCP) Films on Al Alloy. Langmuir 26(13): 10833-10841