Next-generation piezoelectric thin films for MEMS devices

The goal of this project is to establish a versatile thin film platform enabling a broad range of next generation device applications. The piezoelectric and ferroelectric properties and switching dynamics associated with the composite of the thin films will be systematically studied and quantified. The process of the thin film and stack will be optimized for desired device parameters through atomistic to mesoscale material modeling, surface and strain engineering, and machine learning. Novel devices such as ≥24 GHz acoustic filter, phase shifter, digital and analog ferroelectric memory with CMOS circuit compatible switching voltage and high density arrays will be designed and demonstrated for mm-Wave communication and edge computing applications.
In this project, the students will have the opportunity to be exposed to world-class advanced microelectronics processes. By addressing the multidisciplinary challenges in this project, including the material science, device physics, modeling, testing and machine learning assisted data analysis, the students will be comprehensively trained to improve their problem solving capabilities in the microelectronic domain. With the advanced piezoelectric material deposition and process platform, the innovative ideas and device designs of the students will be well supported and demonstrated with help of our experienced process experts. Furthermore, in this cutting-edge domain of MEMS, the students will have plenty of opportunities of publishing their works and attending international conferences.