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Demonstration of Color Display Metasurfaces via Immersion Lithography on a 12-inch Silicon Wafer with critical dimension (CD) below 100nm by complementary metal-oxide semiconductor (CMOS) compatible technology                       
     Reported for the first time by IME's Advanced Optics Program (AOP) team, and published by Optics Express. The paper was selected as Editor's Pick, which recognised work of excellence scientific quality and representative of the work in its research field. read more

           

 
 

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